Resources
The Sensor Lab has in house resources for:
The table below reports some details about the Sensor Lab resources.
| Year of purchase | Description |
| 2000 | Magnetron sputtering plant KENOTEC , with a load-lock system for fast sample introduction. The system is equipped with DC and RF power suppliers and gas lines in order to do reactive sputtering. The chamber has 5 positions, 4 for four inches targets and 1 for etching. The vacuum in the deposition chamber is achieved with a rotative pump and a turbo-molecular pump as pumping system. |
| 1996 | Magnetron sputtering and evaporation plant , with the possibility to work in reactive atmosphere, equipped with DC and RF power suppliers, oscillating quartz for the thickness monitoring. A rotative pump and a cryogenic pump as pumping system, 2 cathodes for 2 inches diameter targets and one position for thermal evaporation. |
| 1990 | ALCATEL 350 magnetron sputtering modified with a load-lock system for a fast samples introduction. The system is equipped with DC and RF power suppliers and gas lines in order to do reactive sputtering. The chamber has 4 positions, 3 for four inches targets and 1 for etching. The vacuum in the deposition chamber is achieved with a rotative pump and a turbo-molecular pump as pumping system. |
| 1996-2002 | Four furnaces for thermal oxidation in dry or humid air and treatments in inert atmosphere. |
| 1994 | An advanced system for the measurement of the DC and AC electrical response of sensors to gas mixtures at variable humidity and controlled temperature, a MS spectrometer monitors the outlet of the test chamber. The system is equipped with one special module designed for photo-activated characterization. |
| 1996 | An advanced system for the measurement of the DC electrical response of up to five sensors to gas mixtures at variable humidity and controlled temperature. The systems is equipped with one special module designed for ozone characterization, kelvin probe measurement and photo-activated characterization. |
| 2002 | An advanced system for the measurement of the DC electrical response of up to ten sensors to gas mixtures at variable humidity and controlled temperature, a MS spectrometer monitors the outlet of the test chambers. |
| 1998-2002 | Two Electronic Noses with static- from vials with a programmable autosampler – and dynamic –stain steel canisters – sampling |
| 1998 | Two stations for ageing of the samples |
| 2000 | Kelvin Probe technique to measure work function differences in semiconductors.The probe model is Kelvin Probe S of Besocke Delta Phi, mounted inside a test chamber with gas in-and out-let. |
| 2001 | An experimental set-up for optical characterisation made by a gas chamber equipped with a quartz window and placed on an active optical bench. On the bench a Multiline Ar laser, a quartz Tungsten Halogen lamp, a single monochromator and a CCD camera can detect the resistance photo-activated response, the photoluminescence and reflectance spectra in the 1eV-4eV range. A Kelvin probe head placed inside the chamber measures the Surface Photo Voltage. |
| 2002 | Two micro-welders for wire bonding and packaging of sensors one based on local welding and the other a brand new Kulicke & Soffa wedge bonder |
| 2002 | An AFM operating in air at normal pressure with six standard SPM modes: AFM, LFM, NC-AFM, IC-AFM, Phase, and STM. Furthermore it can obtain local spectroscopic measurements in air. |
| 2002 | A Precision Spin-Coating System provided with a Programmable Logic Controller. |
| 2004 | A High resolution FE-SEM |